Abstract

An understanding of the photochemical and photo-physical processes, which occur during photo-polymerization, is of extreme importance when attempting to improve a photopolymer material’s performance for a given application. Recent work carried out on the modeling of photopolymers during- and post-exposure, has led to the development of a tool, which can be used to predict the behavior of a number of photopolymers subject to a range of physical conditions. In this paper, we explore the most recent developments made to the Non-local Photo-polymerization Driven Diffusion model, and illustrate some of the useful trends, which the model predicts and then analyze their implications on photopolymer improvement.