Abstract

The Non-local Photo-Polymerization Driven Diffusion (NPDD) model was introduced to describe the observed drop-off in the material’s response for higher exposing spatial frequencies. Recent work carried out on the modeling of the mechanisms which occur in photopolymers during- and post-exposure, has led to the development of a tool, which can be used to predict the behaviour of these materials under a wide range of conditions. In this article, based on the chemical reactions of chain transfer agents, we explore this extended NPDD model, illustrating some of the useful trends, which the model predicts and we analyse their implications on the improvement of photopolymer material performance.