Ma, Beibei and McLoone, Sean F. and Ringwood, John and MacGearailt, Niall (2010) An Analysis of Noise on Optical Emission Spectroscopy Measurements. In: Irish Signals and Systems Conference 2010, June, 2010, Cork.

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Abstract

Optical Emission Spectroscopy (OES) is a non-intrusive plasma diagnostic technique that can be used to measure the chemical changes in a plasma that is in- creasingly being considered for monitoring and control of plasma etch processes. In the practice of collecting OES data for plasma etching, it is inevitable that noise is included in the measurements. The existence of noise can destroy signals or at least make the identi¯cation and interpretation of signal patterns unreliable, hence appropriate ¯lter- ing and pre-processing of the data is needed prior to application of automated feature extraction and analysis techniques. In the absence of a priori knowledge of the noise characteristics and system bandwidth the selection of an appropriate noise suppression ¯lter bandwidth is a challenging problem. This paper explores the characteristics of the noise inherent in OES measurements and proposes a systematic method for establish- ing a suitable noise ¯lter bandwidth based on the auto-correlation and cross-correlation analyses of the ¯ltered signals and their residuals.

Item Type:	Conference or Workshop Item (Paper)
Keywords:	Noise removal; Optical emission spectroscopy; Plasma etch;
Academic Unit:	Faculty of Science and Engineering > Electronic Engineering
Item ID:	3615
Depositing User:	Professor John Ringwood
Date Deposited:	01 May 2012 11:45
Refereed:	Yes
URI:	Publisher
Use Licence:	This item is available under a Creative Commons Attribution Non Commercial Share Alike Licence (CC BY-NC-SA). Details of this licence are available here

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