Lynn, Shane and Ringwood, John and MacGearailt, Niall
Gaussian Process Regression for Virtual Metrology of
In: Irish Signals and Systems Conference 2010, June, 2010, Cork.
Plasma etch is a complex semiconductor manufacturing process in which
material is removed from the surface of a silicon wafer using a gas in plasma form.
As the process etch rate cannot be measured easily during or after processing, virtual
metrology is employed to predict the etch rate instantly using ancillary process variables.
Virtual metrology is the prediction of metrology variables using other easily accessible
variables and mathematical models. This paper investigates the use of Gaussian process
regression as a virtual metrology modelling technique for plasma etch data.
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