Ringwood, John V. and Lynn, Shane and Bacelli, Giorgio and Ma, Beibei Ma and Ragnoli, Emanuele and McLoone, Sean (2010) Estimation and Control in Semiconductor Etch: Practice and Possibilities. IEEE TRANSACTIONS ON SEMICONDUCTOR MANUFACTURING, 23 (1). ISSN 0894-6507

Lynn, Shane and Ringwood, John and MacGearailt, Niall (2012) Gaussian Process Regression for Virtual Metrology of Plasma Etch. In: Irish Signals and Systems Conference 2010, June, 2010, Cork.

Lynn, Shane and Ringwood, John and MacGearailt, Niall (2012) Global and Local Virtual Metrology Models for a Plasma Etch Process. IEEE Transactions on Semiconductor Manufacturing, 25 (1). pp. 94-103. ISSN 0894-6507

Lynn, Shane and MacGearailt, Niall and Ringwood, John (2011) Real-time Virtual Metrology and Control of Plasma Electron Density in an Industrial Plasma Etch Chamber. Proceedings of 18th IFAC World Congress . pp. 12060-12065. ISSN 1474-6670

Lynn, Shane and Ringwood, John and Del Valle Gamboa, Juan Ignacio (2008) State Estimation for the VASIMR Plasma Engine. Signals and Systems Conference, 2008. . pp. 24-29. ISSN 0537-9989

Lynn, Shane (2011) Virtual metrology for plasma etch processes. PhD thesis, National University of Ireland Maynooth.

Lynn, Shane and Ringwood, John and Ragnoli, Emanuele and McLoone, Sean and MacGearailt, Niall (2009) Virtual Metrology for Plasma Etch using Tool Variables. Advanced Semiconductor Manufacturing Conference, 2009. . pp. 143-148. ISSN 1078-8743

Lynn, Shane and Ringwood, John and MacGearailt, Niall (2010) Weighted windowed PLS models for virtual metrology of an industrial plasma etch process. In: IEEE International Conference on Industrial Technology (ICIT), March, 2010, Chile.